Pure high dose metal ion implantation using the plasma immersion technique

Review of Scientific Instruments

Volumn 70, Issue 11, 1999, Pages 4359-4361

  Zhang, T ^a   Tang, B Y ^a   Zeng, Z M ^a   Kwok, T K ^a   Chu, P K ^a   Monteiro, O R ^b   Brown, I G ^b  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0007040107     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1150094     Document Type: Article

References (26)

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