High productivity mask writer with broad operating range

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4409, Issue 1, 2001, Pages 228-237

  Baik, Ki Ho ^a   Chakarian, Varoujan ^a   Dean, Bob ^a   Lu, Maiying ^a   Naber, Bob ^a   Newman, Tom ^a   Wiltze, Mark ^a   Abboud, Frank ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

CAR; Electron beam; GHOST; Graybeam; Lithography; MEBES; OPC; Photomask; ZEP 7000

Indexed keywords

AMPLIFICATION; ELECTRON BEAM LITHOGRAPHY; INTEGRATED CIRCUIT LAYOUT; OPTICS; OPTIMIZATION; PHOTOLITHOGRAPHY; PHOTORESISTS; SEMICONDUCTOR DEVICES;

CHEMICALLY AMPLIFIED RESIST; GRAYBEAM; MASK WRITER; OPTICAL PROXIMITY CORRECTION; PHOTOMASK;

MASKS;

EID: 0035192054     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.438401     Document Type: Article

References (15)

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