Evaluation of a high-dose, extended multipass gray writing system for 130-nm pattern generation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 309-325

  Chabala, Jan M ^a   Weaver, Suzanne ^a   Alexander, David ^a   Pearce Percy, Henry ^a   Lu, Maiying ^a   Cole, Damon ^a   Abboud, Frank ^a  

^a Etec Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CURRENT DENSITY; INTEGRATED CIRCUIT MANUFACTURE; MASKS; SEMICONDUCTOR DEVICE MODELS;

MULTIPASS GRAY WRITING SYSTEM; PATTERN GENERATION;

ELECTRON BEAM LITHOGRAPHY;

EID: 0033699052     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)