Design considerations for an electron-beam pattern generator for the 130-nm generation of masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3748, Issue , 1999, Pages 385-399

  Abboud, F ^a   Babin, S ^a   Chakarian, V ^a   Ghanbari, A ^a   Innes, R ^a   Raymond III, F ^a   Sagle, A ^a   Sauer, C ^a  

^a Etec Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRON BEAMS; MONTE CARLO METHODS; PHOTORESISTS;

CRITICAL DIMENSION (CD); ELECTRON BEAM PATTERN GENERATORS;

MASKS;

EID: 0032641104     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.360239     Document Type: Conference Paper

References (22)