Optimizing style options for sub-resolution assist features

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 1, 2001, Pages 141-152

  Liebmann, Lars W ^a   Bruce, James A ^a   Chu, William ^a   Cross, Michael ^a   Graur, Ioana C ^a   Krueger, Joshua J ^a   Leipold, William C ^a   Mansfield, Scott M ^a   McGuire, Anne E ^a   Sundling, Dianne L ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

Scattering bars; Style options; Sub resolution assist features

Indexed keywords

CMOS INTEGRATED CIRCUITS; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; INTEGRATED CIRCUIT LAYOUT; LIGHT SCATTERING; OPTICAL RESOLVING POWER; OPTIMIZATION;

SUB-RESOLUTION ASSIST FEATURES (SRAF);

PHOTOLITHOGRAPHY;

EID: 0001588746     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.435690     Document Type: Article

References (8)

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7. J. Fung Chen, T. Laidig, K.E. Wampler, R. Caldwell, "Full chip optical proximity correction with depth of focus enhancement", Microlithogr. World (USA) Vol.6, No.3 Summer 1997 P5-6, 8, 10, 13.
8. L. Liebmann, S. Mansfield, "Method of incorporating sub resolution assist features in a photomask layout", IBM Patent application (June 2000).