Improving CDs on a MEBES system by improving the ZEP 7000 development and dry etch process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873 (I, Issue , 1999, Pages 592-599

  Albrethsen Keck, Barbara ^a   Lu, Maiying ^a   Sauer, Charles ^a  

^a Etec Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; DRY ETCHING; MASKS; PLASMA ETCHING; PROCESS ENGINEERING;

CRITICAL DIMENSION CONTROL; ISOFOCAL DOSE;

PHOTORESISTS;

EID: 0033341994     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.373356     Document Type: Conference Paper

References (8)