Initial benchmarking of a new electron-beam raster pattern generator for 130-100 nm maskmaking

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 284-300

  Sauer, Charles ^a   Abboud, Frank ^a   Babin, Sergey ^a   Chakarian, Varoujan ^a   Ghanbari, Abe ^a   Innes, Robert ^a   Trost, David ^a   Raymond III, Frederick ^a  

^a Etec Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; PHOTOLITHOGRAPHY;

CRITICAL DIMENSION (CD); ELECTRON BEAM RASTER PATTERN GENERATOR;

ELECTRON BEAM LITHOGRAPHY;

EID: 0033713411     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (19)