Alternating PSM optimization using model based OPC

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3679, Issue II, 1999, Pages 556-566

  Tritchkov, Alexander ^a   Stirniman, John ^a   Rieger, Michael ^a  

^a Avant! Corp   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOOLEAN FUNCTIONS; COMPUTER SIMULATION; ERROR CORRECTION; MASKS; MATHEMATICAL MODELS; OPTIMIZATION; PHASE SHIFT;

ALTERNATING PHASE SHIFT MASK (APSM); BINARY MASKS (BIM); OPTICAL PROXIMITY EFFECT;

PHOTOLITHOGRAPHY;

EID: 0032652495     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.354368     Document Type: Conference Paper

References (11)