Photoacid generation in chemically amplified resists: Elucidation of structural effects of photoacid generators using new acid-sensitive dyes for monitoring acid generation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 680-691

  Cameron, James F ^a   Mori, J Michael ^a   Zydowsky, Thomas M ^a   Kang, Doris ^a   Sinta, Roger F ^a   King, Matthew ^a   Scaiano, Juan C ^b   Pohlers, Gerd ^b   Virdee, Susan ^c   Connolly, Terry ^b  

^a SHIPLEY COMPANY   (United States)

^b UNIVERSITY OF OTTAWA   (Canada)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ABSORPTION SPECTROSCOPY; CHROMOPHORES; ELECTRON BEAM LITHOGRAPHY; LIGHT ABSORPTION; PHOTORESISTORS; PHOTORESISTS;

ABSORPTION MAXIMUM; ACID GENERATIONS; BATHOCHROMIC SHIFTS; CHEMICALLY AMPLIFIED RESISTS; DESIGN CRITERION; DUV RESISTS; NEW CLASS; PHOTO ACID GENERATORS; PHOTOACID; STRUCTURAL EFFECTS; TRACE AMOUNTS; UV ABSORPTION SPECTRUM;

ACIDS;

EID: 60849116442     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312467     Document Type: Conference Paper

References (32)

1. Thompson, L. F.; Willson, C. G.; Bowden, M. J. Introduction to Microlithography; second ed.; American Chemical Society: Washington, DC, 1994.
2. Dammel, R.; Doessel, K. F.; Lignau, J.; Theis, J.; Huber, H. L.; Oertel, H. Microelectron. Eng. 1986, 5, 97.
3. Feely, W. E.; Imhof, J.; Stein, C. Polym. Eng. Sci. 1986, 26, 1101.
4. Frechet, J. M. J.; Eichler, E.; Ito, H.; Willson, C. G. Polymer 1983, 24, 995.
5. Frechet, J. M. J.; Matuszczak, S.; Reck, B.; Stoever, H. D.; Wilison, C. G. Macromolecules 1991, 24, 1746.
6. Ito, H.; Wilison, C. G. Polym. Eng. Sci. 1983, 23, 1012.
7. Thackeray, J. W.; Orsula, G. W.; Canistro, D.; Berry, A. K. J. Photopolym. Sci. Technol. 1989, 2, 429.
8. Pappas, S. P. J. Imaging Tech. 1985, 11, 146.
9. Burnett, A. R. ; Thomson, R. H. J. Chem. Soc. (C) 1968, 854.
10. Dryanska, V.; Ivanov, C. Tetrahedron Lett. 1975, 41, 3519.
11. Scaiano, J. C. J. Am. Chem. Soc. 1980, 102, 7747.
12. Scaiano, J. C.; Tanner, M.; Weir, D. J. Am. Chem. Soc. 1985, 107, 4396. (13)
13. Thackeray, J. W.; Denison, M. D.; Fedynyshyn, T. H.; Kang, D.; Sinta, R. ACS Symp. Ser 1995, 614, 111.
14. McKean, D. R.; Schaedeli, U.; MacDonald, S. A. J. Polym. Sci.: Part A Polym. Chem. 1989, 27, 3927.
15. Kihara, N.; Saito, S.; Ushirogouchi, T.; Nakase, M. J. Photopolym. Sci. Technol. 1995, 8, 561.
16. Asakawa, K.; Ushirogouchi, T.; Nakase, M. Proc. SPIE-Int. Soc. opt. Eng. 1995, 2438, 563.
17. Ramette, R. W.; Sandell, E. B. J. Am. Chem. Soc. 1956, 78, 4872.
18. Zanker, V.; Peter, W. Ber. 1958, 91, 572.
19. Berlman, I. B. Handbook of Fluorescence Spectra of Aromatic Molecules; Academic Press: New York, 1965.
20. Abdel-Mottaleb, M. S. A.; Loutfy, R. O.; Lapouyade, R. J. Photochem. Photobiol. A:Chem. 1989, 48, 87.
21. Abdel-Mottaleb, M. S. A.; Antonious, M. S.; Ali, M. M. A.; Ismail, L. F. M.; El-Sayed, B. A.; Sherief, A. M. K. Proc. Indian Acad. Sci. 1992, 104, 185.
22. Osman, A.-M.; Youssef, M. S. K. Spectrochim. Acta 1981, 37A, 811.
23. Pohlers, G.; Scaiano, J. C.; Sinta, R.; Brainard, R.; Pai, D. Chem. Mater. 1997, 9, 1353.
24. Eckert, A.R.; Moreau, W.M. SPIE Adv. Resist Technol., 1997, 3049, 879-887.
25. Stewart, R. The Proton: Applications to Organic Chemistry, Academic Press, London, 1985, Chapter 2, pp 9-86.
26. Bessiere, J. Anal. Chem. Acta, 1970, 52, 55-63.
27. Hornya, J. Coll. Czech. Chem. Commun., 1959, 24, 1596-1601.
28. Cerfontain, H.; Schnitger, B.W. Recl. Trav. Chim., 1972, 91, 22-32.
29. Dinus, R.H.; Choppin, G.R. J. Phys. Chem., 1962, 66, 268-270.
30. Guthrie, J.P. Can. J. Chem., 1978, 56, 2342-2354.
31. th Internat'l Conf. Photopolymers, 1997, in press.
32. Thackeray, J.W.; Denison, M.D.; Fedynyshyn, T.H.; Kang, D.; Sinta, R. ACS Symposium Series 614, Microelectronics Technology; Polymers for Advanced Imaging and Packaging, Eds Reichmanis, E.; Ober, C.K.; MacDonald, S.A.; Iwayanagi, T.; Nishikubo, T., 1995, Chapter 7, 110-123.