Correlation of UVIIHS resist chemistry to dissolution rate measurements

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 4267-4271

  Thackeray, J ^a   Fedynyshyn, T H ^a   Kang, D ^a   Rajaratnam, M M ^a   Wallraff, G ^b   Opitz, J ^b   Hofer, D ^b  

^a SHIPLEY COMPANY   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001742995     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588588     Document Type: Article

References (16)

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