Molecular model of phenolic polymer dissolution in photolithography

Journal of Polymer Science, Part B: Polymer Physics

Volumn 37, Issue 16, 1999, Pages 2103-2113

  Flanagin, Lewis W ^a   Singh, Vivek K ^b   Willson, C Grant ^a  

^a The University of Texas at Austin   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DISSOLUTION; IONIZATION; MATHEMATICAL MODELS; MOLECULAR DYNAMICS; MOLECULAR WEIGHT; PHENOLS; PHOTOLITHOGRAPHY; PHOTORESISTS; SURFACE ROUGHNESS;

CHEMICAL BLOCKING; EDGE ROUGHNESS;

ORGANIC POLYMERS;

EID: 0032592674     PISSN: 08876266     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1099-0488(19990815)37:16<2103::AID-POLB13>3.0.CO;2-5     Document Type: Article

References (14)

1. Dammel, R. R. Diazonaphthoquinone-based Resists; SPIE Press: Bellingham, WA, 1993.
2. Thompson, L. F. In Introduction to Microlithography, 2nd ed.; Thompson, L. F.; Willson, C. G.; Bowden, M. J., Eds.; American Chemical Society: Washington, DC, 1994; Chapter 1.
3. Willson, C. G. In Introduction to Microlithography, 2nd ed.; Thompson, L. F.; Willson, C. G.; Bowden, M. J., Eds.; American Chemical Society: Washington, DC, 1994; Chapter 3.
4. Arcus, R. A. In Advances in Resist Technology and Processing III; Willson, C. G., Ed.; Proc. SPIE, SPIE Press: Bellingham, WA, 1986; Vol. 631, pp 124-131.
5. Shih, H.-Y.; Zhuang, H.; Reiser, A.; Teraoka, I.; Goodman, J.; Gallagher-Wetmore, P. M. Macromolecules 1998, 31, 1208.
6. Tsiartas, P. C.; Flanagin, L. W.; Henderson, C. L.; Hinsberg, W. D.; Sanchez, I. C.; Bonnecaze, R. T.; Willson, C. G. Macromolecules 1997, 30, 4656.
7. McAdams, C. L.; Yueh, W.; Tsiartas, P.; Hsieh, D.; Willson, C. G. In Micro- and Nano-Patterning Polymers; Ito, H.; Reichmanis, E., Eds.; ACS Symposium Series, American Chemical Society: Washington, DC, 1998; Vol. 706, pp 292-305.
8. Arthur, G.; Wallace, C.; Martin, B. In Metrology, Inspection, and Process Control for Microlithography XII; Singh, B., Ed.; Proc. SPIE, SPIE Press: Bellingham, WA, 1998; Vol. 3332, pp 538-549.
9. Trefonas, P., III. In Advances in Resist Technology and Processing VI; Reichmanis, E., Ed.; Proc. SPIE, SPIE Press: Bellingham, WA, 1989; Vol. 1086, pp 484-494.
10. Trefonas, P.; Vizvary, G.; Root, J.; Meister, C.; Szmanda, C. In Advances in Resist Technology and Processing XI; Nalamasu, O., Ed.; Proc. SPIE, SPIE Press: Bellingham, WA, 1994; Vol. 2195, pp 707-725.
11. Neureuther, A. R.; Willson, C. G. J Vac Sci Technol B 1988, 6, 167.
12. McAdams, C. L.; Flanagin, L. W.; Henderson, C. L.; Pawloski, A. R.; Tsiartas, P.; Willson, C. G. In Advances in Resist Technology and Processing XV; Conley, W., Ed.; Proc. SPIE, SPIE Press: Bellingham, WA, 1998; Vol. 3333, pp 1171-1179.
13. Flanagin, L. W.; McAdams, C. L.; Hinsberg, W. D.; Sanchez, I. C.; Willson, C. G. Manuscript in preparation.
14. For filling the lattice with polymer chains, one may use alternative methods that allow control of chain length distribution and properly account for excluded volume effects. The authors are currently studying the application of this technique to the systems described in this article.