Imaging of photogenerated acid in a chemically amplified photoresist

Applied Physics Letters

Volumn 73, Issue 3, 1998, Pages 408-410

  Bukofsky, S J ^a   Feke, G D ^a   Wu, Q ^a   Grober, R D ^a   Dentinger, P M ^b   Taylor, J W ^b  

^a Yale University   (United States)

^b UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001191416     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.121850     Document Type: Article

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