Cost of mask fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3048, Issue , 1997, Pages 211-215

  Trybula, Walt ^a   Dance, Daren ^b  

^a SEMATECH   (United States)

^b WWk   (United States)

Author keywords

CoO; Cost modeling; Cost of Ownership; Mask fabrication; Process Cost of Ownership

Indexed keywords

COBALT COMPOUNDS; COSTS; FABRICATION; LIFE CYCLE; MASKS; RELIABILITY ANALYSIS; SEMICONDUCTOR DEVICE MANUFACTURE; THROUGHPUT;

COMPREHENSIVE EVALUATION; COST MODELING; COST OF OWNERSHIP; MASK FABRICATION; PROCESS COSTS; PROCESS REQUIREMENTS; PRODUCTION PROCESS; SEMICONDUCTOR INDUSTRY;

COST BENEFIT ANALYSIS;

EID: 0005105520     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.275777     Document Type: Conference Paper

References (3)

1. Daren Dance and David W. Jimenez, "Applications of Cost of Ownership", Semiconductor International, 1994 September, pp. 6-7.
2. S. Venkatesh and D.T. Phillips, "The SEMATECH Cost of Ownership Model: An Analysis and Critique", SEMATECH/SRC Contract No 91-MC Report Appendices: Cost Analysis Background Material, Reporting Period: 9/1/91 to 9/1/92. Texas SCOE. Texas A&M University.
3. Wright Williams & Kelly, "Understanding and Using Cost of Ownership", WWK Report 1992