Smooth, low-stress, sputtered tantalum and tantalum alloy films for the absorber material of reflective-type EUVL

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 484-495

  Takahashi, M ^a   Ogawa, T ^a   Hoko, H ^a   Hoshino, E ^a   Yamanashi, H ^a   Hirano, N ^a   Chiba, A ^a   Okazaki, S ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ALLOYS; AMORPHOUS FILMS; DRY ETCHING; MASKS; METALLIC FILMS; MULTILAYERS; NITRIDES; SPUTTER DEPOSITION; SURFACE ROUGHNESS; TANTALUM; TANTALUM ALLOYS; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET LITHOGRAPHY; TANTALUM GERMANIDE;

PHOTOLITHOGRAPHY;

EID: 0033700381     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)