EUV mask contact layer defect printability and requirement

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 508-514

  Yan, Pei yang ^a   Lai, Chih wei ^a   Cardinale, Gregory ^a  

^a INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL DEFECTS; MASKS; METALLIC FILMS; METALLIC SUPERLATTICES; MOLYBDENUM; OPACITY; OPTICAL MULTILAYERS; SILICON; SILICON WAFERS; SPECIFICATIONS; STATISTICAL METHODS; ULTRAVIOLET RADIATION;

CRITICAL DIMENSION (CD); EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); PRINTABILITY;

PHOTOLITHOGRAPHY;

EID: 0033683761     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)