Deep-UV resists: Evolution and status

Solid State Technology

Volumn 39, Issue 7, 1996, Pages 164-170+173

  Ito, Hiroshi ^a,b  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTOR DEVICE MANUFACTURE; ULTRAVIOLET RADIATION;

DEEP ULTRAVIOLET (DUV) LITHOGRAPHY; DEEP ULTRAVIOLET (DUV) RESISTS;

PHOTORESISTS;

EID: 0000584916     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

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