Mix and match of nanoimprint and UV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue 1, 2001, Pages 802-809

  Reuther, Freimut ^a   Pfeiffer, Karl ^a   Fink, Marion ^a   Gruetzner, Gabi ^a   Schulz, Hubert ^b   Scheer, Hella Christin ^b   Gaboriau, Freddy ^c   Cardinaud, Christophe ^c  

^a MICRO RESIST TECHNOLOGY GMBH   (Germany)

^b UNIVERSITY OF WUPPERTAL   (Germany)

^c UNIVERSITÉ DE NANTES   (France)

Author keywords

Chemically amplified resist; Mix and match; Nanoimprint lithography; NIL; SU 8; UV lithography

Indexed keywords

INTEGRATED CIRCUITS; PHOTORESISTS; PROBLEM SOLVING; ULTRAVIOLET RADIATION;

CHEMICALLY AMPLIFIED RESISTS; NANOIMPRINT LITHOGRAPHY;

NANOTECHNOLOGY;

EID: 0034763991     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.436708     Document Type: Article

References (13)

1. Imprint lithography with 25-nanometer resolution
2. Sub-10 nm imprint lithography and applications
3. Problems of the nanoimprinting technique for nanometer scale pattern definition
4. Hot embossing in polymers as a direct way to pattern resist
5. New polymer materials for nanoimprinting
6. Novel linear and crosslinking polymers for nanoimprinting with high etch resistance
7. Flow behaviour of thin polymer films used for hot embossing lithography
8. Large scale nanolithography using imprint lithography
9. Large area nanoimprint fabrication of sub-100 nm interdigitated metal arrays
10. A contribution to the flow behaviour of thin polymer films during hot embossing lithography
11. Multistep profiles by mix and match of nanoimprint and UV lithography
12. SU -8: A low-cost negative resist for MEMS
13. High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS