ArF negative resist system using androsterone structure with δ-hydroxy acid for 100-nm phase-shifting lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue I, 2001, Pages 58-66

  Yokoyama, Y ^a   Hattori, T ^a   Kimura, K ^a   Tanaka, T ^a   Shiraishi, H ^a  

^a HITACHI LTD   (Japan)

Author keywords

Androsterone; ArF phase shifting lithography; Intramolecular esterification; Negative resist

Indexed keywords

ACRYLICS; COPOLYMERS; DISSOLUTION; ESTERIFICATION; OPTIMIZATION; PHASE SHIFT;

ANDROSTERONE STRUCTURE;

PHOTORESISTS;

EID: 0034758315     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436901     Document Type: Conference Paper

References (33)