Hybrid plasma system for diamond-like carbon film deposition

Surface and Coatings Technology

Volumn 131, Issue 1-3, 2000, Pages 20-25

  Korzec, D ^a   Fedosenko, G ^a   Georg, A ^a   Engemann, J ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

Diamond like carbon; Plasma processing; Plasma source; Remote plasma; Rf discharge

Indexed keywords

CARBON SOURCE; DEPOSITION; FILM; GAS FLOW; HARDNESS; PRESSURE;

COATING; DIAMOND-LIKE CARBON; FILM; PLASMA TREATMENT; TRIBOLOGY;

EID: 0034529432     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00772-6     Document Type: Conference Paper

References (32)

1. Diamond-like carbon as biological compatible material for cell culture and medical application
2. Recent progress on the tribology of doped diamond-like and carbon alloy coatings: A review
3. Optical properties and applications of diamond-like carbon coatings
4. Diamond-like carbon: State of the art
5. Characterization of ion-beam-deposited diamond-like carbon films
6. Residual stress and microhardness of DLC multilayer coatings
7. Deposition of superhard amorphous carbon films by pulsed vacuum arc deposition
8. Deposition of diamond-like carbon film by laser ion source
9. Laser plasma source of amorphic diamond
10. Carbon films deposited from UV laser plasma
11. Deposition of diamond-like carbon films by photon-enhanced chemical vapour deposition of methane using a windowless hydrogen lamp
12. Thermal gas effusion from diamond-like carbon films
13. Processing-structure-adhesion relationship in CVD diamond films on titanium substrates
14. Gradient metal - a-C:H coatings deposited from dense plasma by a combined PVD/CVD process
15. Amorphous hydrogenated carbon films produced by PECVD
16. Influence of the electron cyclotron resonance microwave plasma on growth and properties of diamond-like carbon films deposited onto rf biased substrates
17. Effect of negative bias voltage on a-C:H films deposited in electron cyclotron resonance plasma
18. CVD-processes by hollow cathode glow discharge
19. 13.56 MHz hollow cathode jet matrix plasma source for large area surface coating
20. Multijet hollow cathode discharge for remote polymer deposition
21. Radio frequency hollow cathode for plasma processing technology
22. Vorrichtung zur Erzeugung einer Vielzahl von Niedertemperatur-Plasmajets
23. Comparison of diamond-like carbon films deposited from 40 kHz and 13.56 MHz r.f. plasmas
24. Influence of substrate temperature and microwave power on the properties of a-C:H films prepared using the ECR-CVD method
25. Langmuir probe measurements in commercial plasma plants
26. Large area lubricant removal by use of capacitively coupled rf and slot antenna microwave plasma
27. CVD-processes by hollow cathode glow discharge
28. The use of refractive index as a measure of diamond-like carbon film quality
29. 2 composition
30. Raman 'fingerprinting' of amorphous carbon films
31. The effects of self-generated DC bias on the characteristics of diamond-like carbon films prepared using ECR-CVD