Amorphous hydrogenated fluorinated carbon films produced by PECVD

Surface and Coatings Technology

Volumn 86-87, Issue PART 1, 1996, Pages 443-448

  Durrant, Steven F ^a   Rangel, Elidiane C ^a   Da Cruz, Nilson C ^a   Castro, Sandra G C ^a   Bica De Moraes, Mário A ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

Actinometric optical emission spectrometry; Fluorinated carbon films; Pecvd; Xps

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; COMPOSITION; CRYSTAL STRUCTURE; HYDROGENATION; PLASMA APPLICATIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

ACETYLENE HELIUM CARBON TETRAFLUORIDE MIXTURES; ACTINOMETRIC OPTICAL EMISSION SPECTROSCOPY; AMORPHOUS HYDROGENATED FLUORINATED CARBON FILM; FLUORINATION; FRAGMENTATION; PLASMA CONCENTRATION; PLASMA POLYMER SURFACE INTERACTION; TRANSMISSION INFRARED SPECTROPHOTOMETRY;

ORGANIC COATINGS;

EID: 0030403009     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(96)02982-9     Document Type: Article

References (28)

1. R. d'Agostino, F. Cramarossa, F. Fracassi, F. Illuzzi and G. Caporiccio, European patent application no. 230993 (1987).
2. H. Yasuda, Plasma Polymerization, Academic Press, New York, 1985.
3. B.D. Ratner, A. Chilkoti and G.P. Lopez, in R. d'Agostino (ed.), Plasma Deposition, Treatment, and Etching of Polymers, Academic Press, New York, 1990, pp. 463-516.
4. Y. Momose, T. Takada and S. Okagaki, in M. Shen and A.T. Bell (eds.), Polymeric Materials Science and Engineering, Proc. of the ACS Division of Polymeric Materials, Denver, 1987, Vol. 56, p. 236.
5. R. d'Agostino and L. Martinu, Plas. Chem. Plasma Process., 11 (1991) 1.
6. H.Z. Wang, M.W. Rembold and J.Q. Wang, J. Appl. Polymer Sci., 49 (1993) 701.
7. R. d'Agostino, R. Lamendola, P. Favia and A. Giquel, J. Vac. Sci. Technol., A 12 (1994) 308.
8. R. d'Agostino, F. Cramarossa and F. Fracassi, in R. d'Agostino (ed.), Plasma Deposition, Treatment, and Etching of Polymers, Academic Press, New York, 1990, Chapter 2, pp. 95-162.
9. T. Nagamatsu, T. Haraguchi and T. Kajiama, in K.S. Shen, Y.N. Chang, J.L. Her and J.Y. Lai (eds.), Proc. of the 8th International Symposium on Plasma Chemistry, ISPC-8, Tokyo, 1987, p. 1380.
10. D. Wang and J. Chen, J. Appl. Polymer Sci., 42 (1991) 233.
11. R. d'Agostino, F. Cramarossa, F. Fracassi, F.E. De Simoni, L. Sabbatini, P.G. Zambonin and G. Caporiccio, Thin Solid Films, 143 (1986) 163.
12. K. Endo and T. Tatsumi, J. Appl. Phys., 78 (1995) 1370.
13. R. d'Agostino, F. Cramarossa and F. Illuzzi, J. Appl. Phys., 61 (1987) 2754.
14. S.F. Durrant, R.P. Mota and M.A. Bica de Moraes, J. Appl. Phys., 71 (1992) 448.
15. S.F. Durrant, E.C. Rangel and M.A. Bica de Moraes, J. Vac. Sci. Technol., A 13 (1995) 1901.
16. S.F. Durrant and M.A. Bica de Moraes, J. Vac. Sci. Technol., A 13 (1995) 2513.
17. S.F. Durrant and M.A. Bica de Moraes, Thin Solid Films, 277 (1996) 115.
18. S.F. Durrant, N. Marçal, S.G. Castro, R.C.G. Vinhas, M.A. Bica de Moraes and J.H. Nicola, Thin Solid Films, 259 (1995) 139.
19. J.H. Scofield, J. Electron Spectrom. Relat. Phenom., 8 (1976) 129.
20. C.D. Wagner, W.M. Riggs, L.E. Davis, J.F. Moulder and G.E. Muilenberg, Handbook of Photoelectron Spectroscopy, Perkin-Elmer, Eden Prairie, MN, 1979, p. 21.
21. S.F. Durrant, R.P. Mota and M.A. Bica de Moraes, Thin Solid Films, 220 (1992) 295.
22. H. Yasuda, M.O. Bumgarner, H.C. Marsh and N. Morosoff, J. Polymer Sci. Polymer Chem. Edn., 14 (1976) 195.
23. R.E. Sah, B. Dischler, A. Bubenzer and P. Koidl, Appl. Phys. Lett., 46 (1985) 739.
24. H. Giegengack and D. Hinze, Phys. Stat. Sol., A 8 (1971) 513.
25. L. Martinu, H. Biederman and J. Nedbal, Thin Solid Films, 136 (1986) 11.
26. D.T. Clark, B.J. Cromarty and A. Dilks, J. Polymer Sci. Polymer Chem. Edn., 16 (1978) 3173.
27. D.T. Clark and A. Harrison, J. Polymer Sci. Polymer Chem. Edn., 19 (1981) 1945.
28. D.T. Clark and M.Z. Abraham, J. Polymer Sci. Polymer Chem. Edn., 20 (1982) 1717.