Processing-structure-adhesion relationship in CVD diamond films on titanium substrates

Diamond and Related Materials

Volumn 8, Issue 1, 1999, Pages 17-24

  Buccioni, E ^a   Braca, E ^a   Kenny, J M ^a   Terranova, M L ^b  

^a UNIVERSITY OF PERUGIA   (Italy)

^b UNIVERSITY OF ROME TOR VERGATA   (Italy)

Author keywords

Adhesion; Hardness; HFCVD diamond; Titanium substrates

Indexed keywords

ADHESION; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; DELAMINATION; FRACTURE; HARDNESS; INTERFACES (MATERIALS); MORPHOLOGY; PROTECTIVE COATINGS; SYNTHETIC DIAMONDS; TITANIUM; TITANIUM ALLOYS;

DIAMOND COATINGS; GRAZING INCIDENCE DIFFRACTION (GID); HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD);

DIAMOND FILMS;

DIAMOND;

EID: 0032986980     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(98)00251-9     Document Type: Article

References (12)

1. Zhu W., Stoner R., Williams B.E., Glass J.T. Proc. IEEE. 79:1991;621.
2. Angus J.C. Thin Solid Films. 216:1992;126.
3. Perry S.S., Ager III J.W., Somorjai G.A., McClelland R.J., Drory M.D. J. Appl. Phys. 74:1993;7542.
4. Ager III J.W., Drory M.D. Phys. Rev. 48:1993;2601.
5. Scardi P., Leoni M., Sessa V., Terranova M.L., Cappuccio G. Mater. Sci. Forum. 228 229 230 231:1996;451.
6. Vlassak J.J., Drory M.D., Nix W.D. J. Mater. Res. 12(7):1997;1900.
7. Catledge S.A., Vohara Y.K. J. Appl. Phys. 83:1998;198.
8. Takeuchi S., Murakawa M. Diamond Films Technol. 5:1995;275.
9. Cappuccio G., Sessa V., Terranova M.L., Veroli C. Mater. Sci. Forum. 166 167 168 169:1994;325.
10. Terranova M.L., Rossi M., Vitali G. J. Appl. Phys. 80:1996;1.
11. Terranova M.L. J. Chem. Vapor Deposit. 3:1995;193.
12. G. Cappuccio, M.L. Terranova, V. Sessa, Proc. V School on XRP from Polycrystalline Material, 1996, p. 259.