Multi-jet hollow cathode discharge for remote polymer deposition

Surface and Coatings Technology

Volumn 93, Issue 1, 1997, Pages 128-133

  Korzec, D ^a   Engemann, J ^a   Mildner, M ^a   Ningel, K P ^a   Borgmeier, O ^a   Theirich, D ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

Plasma polymerization; Plasma source; R.F. Discharge; Remote plasma

Indexed keywords

ARGON; CATHODES; DEPOSITION; ELECTRIC DISCHARGES; MONOMERS; PLASMA JETS; PLASMA SOURCES; POLYMERIZATION; SUBSTRATES;

HOLLOW CATHODE DISCHARGES (HCD);

PLASTIC FILMS;

EID: 0031199462     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00022-4     Document Type: Article

References (28)

1. Anlage zum kontinuierlichen Behandeln von Textilprodukten mit Hilfe von Niedertemperatur-Plasma, Sando Iron Works Co., Ltd., German patent DE 33 00 095 Al.
2. M.F. Bottin, H.P. Schreiber, J. Klemberg-Sapieha, M.R. Wertheimer, Modifiaction of paper surface properties by microwave plasmas, J. Appl. Polym. Sci. 38 (1984) 193-200
3. K.G. Mayhan, A.W. Hahn, M.R. Havens, B.W. Peace, Plasma formed polymers for biomedical application Part I. Synthesis and fundamental studies, NBS Spec. Pub. 415 (1975) 1-12
4. E. Kay, J.W. Coburn, G. Kruppa, Mass spectrometric studies of both polymerizing and etching fluorocarbons glow discharges, Mass Spectrom. Studies 183 (1976) 89-95
5. L. Bardos, S. Berg, Low pressure r.f. plasma-jet - a new tool for surface processing, Surf. Coat. Technol. 54/55 (1992) 91-95
6. L. Bardos, S. Berg, H.-O. Blom, Superhigh-rate plasma jet etching of silicon, Appl. Phys. Lett. 55 (1989) 1615-1617
7. L. Bardos, S. Berg, H.-O. Blom, A.M. Barkiund, The very high-rate plasma-jet dry etching technique, J. Electrochem. Soc. 137 (1990) 1587-1591
8. A.M. Barkiund, H.-O. Blom, S. Berg, Patterning of silicon wafers using the plasma jet dry etching technique, Vacuum 41 (1990) 899-901
9. L. Bardos, S. Berg, H. Barankova, J.-O. Carlsson, Reactive deposition of diamond and Si carbide films by hydrogen plasma etching of graphite and Si in the r.f. plasma jet, Thin Solid Films 223 (1993) 218-222
10. L. Bardos, S. Berg, H. Barankova, Radio frequency plasma jet applied to coating of internal walls of narrow tubes, J. Vac. Sci. Technol A 11 (1993) 148-1490
11. L. Bardos, V. Dusek, High-rate jet plasma-assisted chemical vapour deposition, Thin Solid Films 158 (1988) 265-270
12. H. Barankova, L. Bardos, S. Berg, Enhancement of the reactive deposition rate of TiN films at low nitrogen content, J. Electrochem. Soc. 141 (1994) L8-L9
13. D. Korzec, M. Schott, J. Engemann, Radio frequency hollow cathode discharge for large area double sided foil processing, J. Vac. Sci. Technol. A 13 (1995) 843-848
14. A.M. Barkiund, H.-O. Blom, S. Berg, Plasma jet dry etching using different electrode configurations, J. Vac. Sci. Technol. A 9 (1991) 1055-1057
15. L. Bardos, H. Barankova, T. Nyberg, S. Berg, Deposition of carbonaceous films onto internal walls of tubes, J. Electrochem. Soc. 141 (1994) 37-377
16. D. Korzec, D. Theirich, E. Werner, K. Traub, J. Engemann, Remote and direct microwave plasma deposition of HMDSO films: Comparisonal study, Surf. Coat. Technol. 74-75 (1995) 67-74
17. M.R. Pendler, M. Shen, A.T. Bell, M. Millard, ESCA characterization of plasmapolymerized fluorcarbons, in: M. Shen, A.T. Bell (Eds.), Plasma Polymerization, ACS Symp. Series 108, (1979) 147-162.
18. A. Brockhaus, C. Borchardt, J. Engemann, Langmuir probe measurements in commercial plasma plants, Plasma Sources Sci. Technol. 3 (1994) 539-544
19. E.W. Peterson, L. Talbot, Collisionless electrostatic single-probe and double probe measurements, AIAA J. 8 (1970) 2215-2219
20. Z. Zakrzewski, T. Kopiczynski, Effect of collisions on positive ion collection by a cylindrical Langmuir probe, Plasma Physics 16 (1974) 1195-1198
21. M. Sicha, M. Tichy, V. Hiachova, P. David, T. David, J. Tous, A method for the ion density estimation from the double probe data at medium and higher pressure, Contrib. Plasma Phys. 34 (1994) 51-57
22. M. Tichy, M. Sicha, P. David, T. David, A collisional model of the positive ion collection by a cylindrical Langmuir probe, Contrib. Plasma Phys. 34 (1994) 59-68
23. D. Korzec, K.-P. Ningel, B. Pfannkuchen, J. Engemann, Characterization of a radio frequency hollow cathode plasma jet for remote processing, in: Proceedings of 10th International Conference on Plasma Processes CIP 95, Antibes, June 11-15, 1995.
24. M. Shen, Alexis T. Bell, A review of recent advances in plasma polymerization, in: M. Shen, A.T. Bell, (Eds.), Plasma Polymerization, ACS Symp. Ser. 108, 1-33.
25. A. Dilks, E. Kay, Metal-containing fluoropolymer films produced by simultaneous plasma etching and polymerization, in M. Shen, A.T. Bell, (Eds.), Plasma Polymerization, ACS Symp. Ser. 108, 195-218.
26. E. Kay, A. Dilks, Plasma polymerization of fluorcarbons in r.f. capacitively coupled diode system, J. Vac. Sci. Technol. 18 (1981) 1-11
27. N.G. Colthup, L.H. Daly, S.E. Wiberley, Introduction to infrared and Raman spectroscopy, Academic Press, New York, 1964.
28. R. Winter, D. Korzec, N. Sprang, D. Theirich, J. Engemann, PTFE surface modification with broad pressure range slot antenna microwave discharge, Surf. Coat. Technol. 7475 (1995) 618-624