Influence of substrate temperature and microwave power on the properties of a-C:H films prepared using the ECR-CVD method

Diamond and Related Materials

Volumn 6, Issue 11, 1997, Pages 1683-1688

  Yoon, S F ^a   Yang, H ^a   Rusli, ^a   Ahn, J ^a   Zhang, Q ^a   Poo, T L ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

Amorphous carbon; Chemical vapour deposition; Electron cyclotron resonance

Indexed keywords

EID: 0000646899     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(97)00094-0     Document Type: Article

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