High-intensity sources of incoherent UV and VUV excimer radiation for low-temperature materials processing

Applied Surface Science

Volumn 168, Issue 1-4, 2000, Pages 29-36

  Kogelschatz, U ^a   Esrom, H ^b   Zhang, J Y ^c   Boyd, I W ^c  

^a ABB CORPORATE RESEARCH   (Switzerland)

^b UNIVERSITY OF APPLIED SCIENCES   (Germany)

^c UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CURING; DEPOSITION; ETCHING; LIGHT SOURCES; LOW TEMPERATURE OPERATIONS; PHOTOCHEMICAL REACTIONS; POLYMERS; SPONTANEOUS EMISSION; ULTRAVIOLET RADIATION;

PATTERNED METAL DEPOSITION; PHOTODEPOSITION; VACUUM ULTRAVIOLET RADIATION;

EXCIMER LASERS;

EID: 0034513052     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00571-7     Document Type: Article

References (85)

1. Lorents D.C. Phys. C. 82:1976;19.
2. S. Watanabe, H. Kashiwagi, Oyo Buturi (Japan) 46 (1977) 978 (in Japanese).
3. Ch.K. Rhodes (Ed.), Excimer Lasers, Springer, New York, 1979 and 1984.
4. Lakoba I.S., Yakovlenko S.I. Sov. J. Quantum Electron. 10:1980;389.
5. Gerasimov G.N., Krylov B.E., Loginov A.V., Shchukin S.A. Sov. Phys. Usp. 35:1992;400.
6. Eliasson B., Kogelschatz U. Appl. Phys. B. 46:1988;299.
7. Gochelashvili A.P., Dem'yanov A.V., Kochetov J.V., Yangurazova L.R. Laser Phys. 3:1993;140.
8. Ivanov V.V., Klopovskii K.S., Mankelevich Yu.A., Rakhimov A.T., Rakhimova T.V., Rulev G.B., Saenko V.B. Laser Phys. 6:1996;654.
9. F. Vollkommer, L. Hitzschke, in: G. Babucke (Ed.), in: Proceedings of the 8th International Symposium on Science Technology Light Sources (LS-8), Greifswald, Germany, 1998, pp. 51-60.
10. Kubodera S., Honda M., Kitahara M., Kawanaka J., Sasaki W., Kurosawa K. Jpn. J. Appl. Phys. 34:1995;L618.
11. G.N. Gerasimov, G.A. Volkova, G.N. Zvereva, in: G. Babucke (Ed.), in: Proceedings of the 8th International Symposium on Science Technology Light Sources (LS-8), Greifswald, Germany, 1998, pp. 248-249.
12. Tanaka Y. J. Opt. Soc. Am. 45:1955;710.
13. Pavlovskaya E.N., Yakovleva A.V. Opt. Spectrosc. (USSR). 54:1983;132.
14. Kogelschatz U., Eliasson B., Esrom H. Mater. Design. 12:1991;251.
15. Kogelschatz U. Appl. Surf. Sci. 54:1992;410.
16. Boyd I.W., Zhang J.-Y. Nucl. Inst. Methods Phys. Res. B. 121:1997;349.
17. Eliasson B., Kogelschatz U. IEEE Trans. Plasma Sci. 19:1991;309.
18. Kogelschatz U. Pure Appl. Chem. 62:1990;1667.
19. Gellert B., Kogelschatz U. Appl. Phys. B. 52:1991;14.
20. U. Kogelschatz, in: V. Palleschi, D.P. Singh, M. Vasselli (Eds.), in: Proceedings of the XX International Conference on Phenomena in Ionized Gases (ICPIG-XX), Barga, Italy, 1991, pp. 218-227 (invited papers).
21. Gerber T., Luethy W., Burkhardt P. Opt. Commun. 35:1980;242.
22. Borisov V.M., Davidovskii A.M., Kristoforov O.B. Sov. J. Quantum Electron. 12:1982;1403.
23. Boichenko A.M., Skakun V.S., Tarasenko V.F., Fomin E.A., Yakovlenko S.I. Laser Phys. 4:1994;635.
24. V.F. Tarasenko, M.I. Lomaev, A.N. Pachenko, V.S. Skakun, E.A. Sosnin, in: R. Kossowsky, M. Jelinek, R.F. Walter (Eds.), High Power Lasers, Kluwer, Dordrecht, 1996, pp. 331-345.
25. Lomaev M.I., Pachenko A.N., Skakun V.S., Sosnin E.A., Tarasenko V.F., Adamson M.G., Myers B.R., Wang F.T. Laser Particle Beams. 15:1997;339.
26. Bollanti S., Clementi G., Di Lazzaro P., Flora F., Giordano G., Letardi T., Muzzi F., Shina G., Zheng Z.E. IEEE Trans. Plasma Sci. 27:1999;211.
27. Kawanaka J., Shirai T., Kubodera S., Sasaki W. Proc. SPIE. 3574:1998;466.
28. Tanaka Y., Zelikoff M. J. Opt. Soc. Am. 44:1954;254.
29. Wilkinson P.G., Tanaka Y. J. Opt. Soc. Am. 45:1955;344.
30. Huffman R.E., Larrabee J.C., Tanaka Y. Appl. Opt. 4:1965;1581.
31. Wilkinson P.G., Byram E.T. Appl. Opt. 4:1965;581.
32. Kumagai H., Obara M. Appl. Phys. Lett. 55:1989;1583.
33. Kumagai H., Obara M. Jpn. J. Appl. Phys. Lett. 28:1989;L 2228.
34. Hassal S.B., Ballik E.A. J. Appl. Phys. 70:1991;1042.
35. Hassal S.B., Ballik E.A. Can. J. Phys. 69:1991;699.
36. Kumagai H., Toyoda K. Appl. Phys. Lett. 59:1991;2811.
37. Zakharenko O.A., Kuznetsov A.A., Slinko V.N., Sulakshin S.S. Sov. J. Quantum Electron. 20:1990;813.
38. Ametepe J.D., Diggs J., Manos D.M., Kelley M.J. J. Appl. Phys. 85:1999;7005.
39. J.D. Frank, M. Cekic, C.H. Wood, in: Proceedings of the 32nd Microwave Power Symposium, Ottawa, CA, 1997, pp. 60-63.
40. R. Mehnert, in: R. Mehnert, A. Pincus, I. Janorski, R. Stowe, A. Berejka (Eds.), UV & EB Curing Technology & Equipment, Wiley, New York, 1999, pp. 83-105.
41. R. Mehnert, in: Proceedingsof the RadTech Europe 99, Berlin, 1999, pp. 303-310.
42. Stockwald K., Neiger M. Contrib. Plasma Phys. 35:1995;15.
43. Zhang J.-Y., Boyd I.W. J. Appl. Phys. 80:1996;633.
44. Zhang J.-Y., Boyd I.W. J. Appl. Phys. 84:1998;1174.
45. Falkenstein Z., Coogan J.J. J. Phys. D: Appl. Phys. 30:1997;2704.
46. Kessler F., Mohring H.-D., Bauer G.H. Mater. Res. Soc. Symp. Proc. 192:1990;559.
47. Kessler F., Bauer G.H. Appl. Surf. Sci. 54:1992;430.
48. Manfredotti C., Fizzotti F., Boero M., Piatti G. Appl. Surf. Sci. 69:1993;127.
49. Manfredotti C., Fizzotti F., Osenga C., Amato G., Boarino L. Phys. Stat. Sol. A. 135:1993;191.
50. Redondas X., Gonzáles P., León B., Pérez-Amor M. Surf. Coat. Technol. 100/101:1998;160.
51. Bergonzo P., Kogelschatz U., Boyd I.W. Appl. Surf. Sci. 69:1993;393.
52. Gonzáles P., Garcia E., Pou J., Fernández D., Serra J., León B., Pérez-Amor M. Thin Solid Films. 421:1993;348.
53. Bergonzo P., Boyd I.W. J. Appl. Phys. 76:1994;4372.
54. Bergonzo P., Boyd I.W. Microelectron. Eng. 25:1994;345.
55. Calloway A.R., Galantowicz T.A., Fenner W.R. J. Vac. Sci. Technol. A. 1:1983;534.
56. Esrom H., Demny J., Kogelschatz U. Chemtronics. 4:1989;202.
57. Esrom H., Kogelschatz U. Thin Solid Films. 218:1992;231.
58. J.-Y. Zhang, Ph.D. Thesis, Karlsruhe University, Germany, 1993.
59. Zhang J.-Y., Esrom H., Boyd I.W. Appl. Surf. Sci. 96-98:1996;399.
60. Zhang J.-Y., Boyd I.W. Thin Solid Films. 318:1998;234.
61. Lafferty E.J., Macauley E.D.J., Mongey K.F., Kelly P.V., Crean G.M. Appl. Surf. Sci. 100/101:1998;80.
62. Zhang J.-Y., Boyd I.W., Draper S. Surf. Coat. Technol. 100/101:1998;469.
63. S. Tanimoto, M. Matsui, K. Kamisako, K. Kuroiwa, Y. Tarui, J. Electrochem. Soc. 139 (1992).
64. Nishimura Y., Tokunaga K., Tsuji M. Thin Solid Films. 226:1993;144.
65. Kwon K.W., Kang C.S., Park S.O., Kang H.K., Ahn S.T. IEEE Trans. Electron. Dev. 43:1996;919.
66. Zhang J.-Y., Lim B., Dusastre V., Boyd I.W. Appl. Phys. Lett. 73:1998;2299.
67. Demiryont H., Sites J.R., Geib K. Appl. Opt. 24:1985;490.
68. Autran J.L., Paillet P., Leray J.L., Devine R.A.B. Sens. and Actuators A. 51:1995;5.
69. McKinley K.A., Sandler N.P. Thin Solid Films. 290/291:1996;440.
70. P. Singer, Semiconductor Int. Oct. (1994) 34.
71. Murarka S.P. Solid State Technol. 39:1996;83.
72. Zhang J.-Y., Boyd I.W. Opt. Mater. 9:1998;251.
73. J.-Y. Zhang, I.W. Boyd, E-MRS Spring Meeting 1999 (to be published: Appl. Surf. Sci. 2000).
74. Boyd I.W., Craciun V., Kazor A. Jpn. J. Appl. Phys. 32:1993;6141.
75. Eftekhari G. J. Electrochem. Soc. 140:1993;787.
76. Craciun V., Hutten B., Williams D.E., Boyd I.W. Electron. Lett. 34:1998;71.
77. Esrom H., Zhang J.-Y., Kogelschatz U. Mat. Res. Symp. Proc. 236:1992;39.
78. Zhang J.-Y., Esrom H., Kogelschatz U., Emig G. Appl. Surf. Sci. 69:1993;299.
79. Zhang J.-Y., Boyd I.W., Esrom H. Surf. Interface Anal. 24:1996;718.
80. J.-Y. Zhang, H. Esrom, G. Emig, U. Kogelschatz, in: K.L. Mittal (Ed.), Polymer Surface Modification: Relevance to Adhesion, VSP, Utrecht, 1996, pp. 153-185.
81. H. Esrom, J.-Y. Zhang, U. Kogelschatz, in: K.L. Mittal, K.-W. Lee (Eds.), Polymer Surfaces and Interfaces: Charaterization, Modification and Application, VSP, Utrecht, 1997, pp. 27-35.
82. Andrew J.E., Dyer P.E., Forster D., Key P.H. Appl. Phys. Lett. 43:1983;717.
83. Lazare S., Hoh P.D., Baker J.M., Srinivasan R. J. Am. Chem. Soc. 106:1984;4288.
84. Nakata T., Kannari F., Obara M. Optoelectron. Devices Technol. 8:1993;179.
85. Zhang J.-Y., Esrom H., Kogelschatz U., Emig G. J. Adhesion Sci. Technol. 8:1994;1179.