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Electronics Letters
Volumn 34, Issue 1, 1998, Pages 71-72
Low temperature VUV-assisted oxidation of Ge
Author keywords

[No Author keywords available]
Indexed keywords

ELLIPSOMETRY; EXCIMER LASERS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GERMANIUM COMPOUNDS; OXIDATION; PHOTOCHEMICAL REACTIONS; REACTION KINETICS; STOICHIOMETRY; ULTRAVIOLET RADIATION; VACUUM APPLICATIONS; X RAY PHOTOELECTRON SPECTROSCOPY;
EID: 0032495310     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:19980072     Document Type: Article
Times cited : (15)
References (9)
  • 1
    • 0019617908 scopus 로고
    • Laser-induced oxidation of silicon
    • BOYD, I.W., and WILSON, J.I.B.: 'Laser-induced oxidation of silicon', Thin Solid Films, 1981, 83, pp. L173-L176
    • (1981) Thin Solid Films , vol.83
    • Boyd, I.W.1    Wilson, J.I.B.2
  • 2
    • 0027855404 scopus 로고
    • Vacuum-ultra-violet and ozone induced oxidation of silicon and silicon-germanium
    • BOYD, I.W., CRACIUN, V., and KAZOR, A.: 'Vacuum-ultra-violet and ozone induced oxidation of silicon and silicon-germanium', Jpn. J. Appl. Phys., 1993, 32, pp. 6141-6146
    • (1993) Jpn. J. Appl. Phys. , vol.32 , pp. 6141-6146
    • Boyd, I.W.1    Craciun, V.2    Kazor, A.3
  • 3
    • 0030262459 scopus 로고    scopus 로고
    • Low temperature photo-oxidation of silicon using deep UV radiation
    • ZHANG, J.Y., and BOYD, I.W.: 'Low temperature photo-oxidation of silicon using deep UV radiation', Electron. Lett., 1996, 32, pp. 2097-2098
    • (1996) Electron. Lett. , vol.32 , pp. 2097-2098
    • Zhang, J.Y.1    Boyd, I.W.2
  • 5
    • 84967831685 scopus 로고
    • Electron cyclotron resonance plasma and thermal oxidation mechanisms of germanium
    • WANG, Y., HU, Y.Z., and IRENE, E.A.: 'Electron cyclotron resonance plasma and thermal oxidation mechanisms of germanium', J. Vac. Sci. Technol., 1994, A12, pp. 1309-1314
    • (1994) J. Vac. Sci. Technol. , vol.A12 , pp. 1309-1314
    • Wang, Y.1    Hu, Y.Z.2    Irene, E.A.3
  • 6
    • 0031546191 scopus 로고    scopus 로고
    • New large area ultraviolet lamp sources and their applications
    • BOYD, I.W., and ZHANG, J.Y.: 'New large area ultraviolet lamp sources and their applications', Nucl. Instrum. Methods, 1997, B121, pp. 349-356
    • (1997) Nucl. Instrum. Methods , vol.B121 , pp. 349-356
    • Boyd, I.W.1    Zhang, J.Y.2
  • 7
    • 0004862684 scopus 로고
    • Dihedral-angle-averaged Bethe lattice for vibrations in glasses
    • BARRIO, R.A., GALEENER, F.L., and MARTINEZ, E.: 'Dihedral-angle-averaged Bethe lattice for vibrations in glasses', Phys. Rev., 1985, B31, pp. 7779-7787
    • (1985) Phys. Rev. , vol.B31 , pp. 7779-7787
    • Barrio, R.A.1    Galeener, F.L.2    Martinez, E.3
  • 8
    • 0040144280 scopus 로고
    • Chemical bonding of hydrogen and oxygen in glow-discharge-deposited thin films of a-Ge:H and a-Ge:(H,O)
    • LUCOVSKY, G., CHAO, S.S., YANG, J., TYLER, J.E., ROSS, R.C., and CZUBATYJ, W.: 'Chemical bonding of hydrogen and oxygen in glow-discharge-deposited thin films of a-Ge:H and a-Ge:(H,O)', Phys. Rev., 1985, 31, pp. 2190-2197
    • (1985) Phys. Rev. , vol.31 , pp. 2190-2197
    • Lucovsky, G.1    Chao, S.S.2    Yang, J.3    Tyler, J.E.4    Ross, R.C.5    Czubatyj, W.6
  • 9
    • 21544449965 scopus 로고
    • New SiGe dielectrics grown at room temperature by low-energy ion beam oxidation and nitridation
    • VANCAUWENBERGHE, O., HELLMAN, O.C., HERBOTS, N., and TAN, W.J.: 'New SiGe dielectrics grown at room temperature by low-energy ion beam oxidation and nitridation', Appl. Phys. Lett., 1991, 59, pp. 2031-2033
    • (1991) Appl. Phys. Lett. , vol.59 , pp. 2031-2033
    • Vancauwenberghe, O.1    Hellman, O.C.2    Herbots, N.3    Tan, W.J.4

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.