Decomposition mechanisms of thin palladium acetate film with excimer UV radiation

Applied Surface Science

Volumn 96-98, Issue , 1996, Pages 399-404

  Zhang, Jun Ying ^a   Esrom, Hilmar ^b   Boyd, Ian W ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

^b Institute of Technology Mannheim   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; EXCIMER LASERS; IRRADIATION; LASER BEAM EFFECTS; MASS SPECTROMETRY; MATHEMATICAL MODELS; NUCLEATION; PALLADIUM COMPOUNDS; REACTION KINETICS; SURFACE TREATMENT; THIN FILMS;

DECOMPOSITION MECHANISMS; DEPOSITION RATE; EXCIMER UV RADIATION; EXPOSURE TIMES; PHOTOLYTIC DECOMPOSITION; THIN PALLADIUM ACETATE FILM;

DECOMPOSITION;

EID: 0030562906     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(95)00493-9     Document Type: Article

References (32)

1. M.E. Gross, G.J. Fisanick, P.K. Gallagher, K.J. Schnoes and M.D. Fennell, Appl. Phys. Lett. 47 (1985) 923.
2. G.J. Fisanick, M.E. Gross, J.B. Hopkins, M.D. Fennell, K.J. Schnoes and A. Katzir, J. Appl. Phys. 57 (1985) 1139.
3. M.E. Gross, A. Appelbaum and P.K. Gallagher, J. Appl. Phys. 61 (1987) 1628.
4. A. Auerbach, Appl. Phys. Lett. 47 (1985) 669.
5. A. Gupta and R. Jagannathan, Appl. Phys. Lett. 51 (1987) 2254.
6. C.T. Lin, H.Y. Lee and M.A. Souto, J. Mater. Res. 6 (1991) 760.
7. H.S. Cole, Y.S. Liu, J.W. Rose, R. Guida, L.M. Levinson and H.R. Philipp, in: Laser Processes for Microelectronic Applications, Proc. of the Electrochemical Society, Pennington, NJ, USA, Vol. 88-10, Eds. J.J. Ritsko, D.J. Ehrlich and M. Kashiswagi (1988) p. 187.
8. H. Esrom and G. Wahl, Chemtronics 4 (1989) 216.
9. C.M. Harish, V. Kumar and A. Prabhakar, J. Electrochem. Soc. 135 (1988) 2903.
10. M.E. Gross, Chemtronics 4 (1989) 197.
11. H.S. Cole, Y.S. Liu, J.W. Rose and R. Guida, Appl. Phys. Lett. 53 (1988) 2111.
12. Y.S. Liu and H.S. Cole, Chemtronics 4 (1989) 209.
13. R.C. Sausa, A. Cupta and J.R. White, J. Electrochem. Soc. 134 (1987) 2707.
14. R.C. Sausa, A. Gupta and J.R. White, in: Laser Processes for Microelectronic Applications, Proc. of the Electrochemical Society, Pennington, NJ, USA, Vol. 88-10, Eds. J.J. Ritsko, D.J. Ehrlich and M. Kashiswagi (1988) p. 172.
15. P. Bergonzo, Thesis, University College London (1994).
16. C.H.-J. Huang and T.A. Rabson, IEEE Electron Device Lett. 13 (1992) 609.
17. A. Auerbach, J. Electrochem. Soc. 132 (1985) 1437.
18. P. Hoffmann, B. Lecohier, S. Goldoni and H. Van Den Bergh, Appl. Surf. Sci. 43 (1989) 54.
19. H. Esrom, J. Demny and U. Kogelschatz, Chemtronics 4 (1989) 202.
20. B. Eliasson, M. Hirth and U. Kogelschatz, J. Phys. D (Appl. Phys.) 20 (1987) 1421.
21. B. Eliasson and U. Kogelschatz, Appl. Phys. B 46 (1988) 299.
22. U. Kogelschatz, Pure Appl. Chem. 62 (1990) 1667.
23. B. Gellert and U. Kogelschatz, Appl. Phys. B 52 (1991) 14.
24. U. Kogelschatz, Appl. Surf. Sci. 54 (1992) 410.
25. H. Esrom and U. Kogelschatz, Thin Solid Films 218 (1992) 231.
26. H. Esrom and U. Kogelschatz, Appl. Surf. Sci. 46 (1990) 158.
27. H. Esrom, J.-Y. Zhang, U. Kogelschatz and A.J. Pedraza, Appl. Surf. Sci. 86 (1995) 202.
28. J.-Y. Zhang, Thesis, University of Karlsruhe, Germany (1993).
29. Y. Zhang and M. Stuke, Appl. Surf. Sci. 46 (1990) 153.
30. P.K. Gallagher and M.E. Gross, J. Thermal. Anal. 31 (1986) 1231.
31. H. Esrom and U. Kogelschatz, Appl. Surf. Sci. 54 (1992) 440.
32. E.L. Simmons, J. Phys. Chem. 75 (1971) 588.