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Volumn 100-101, Issue 1-3, 1998, Pages 160-163

Dependence on the C2H4 and SiH4 gas mixture of the Si-C film properties obtained by excimer lamp chemical vapour deposition

(4) Redondas, X a Gonzalez P a Leon B a Perez Amor M a

a UNIVERSITY OF VIGO (Spain)

Author keywords

Excimer lamp; Photo CVD; Photodissociation; Silicon carbon; Thin films

Indexed keywords

ALUMINUM; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; DISSOCIATION; ETHYLENE; GLASS; HYDROGEN BONDS; PHOTOCHEMICAL REACTIONS; REFRACTIVE INDEX; SILANES; SILICON; SILICON CARBIDE;

EXCIMER LAMP CHEMICAL VAPOR DEPOSITION;

AMORPHOUS FILMS;

EID: 0032023165 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(97)00607-5 Document Type: Article

Times cited : (7)

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