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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 12 B, 2000, Pages 6881-6896

Electron scattering and related phenomena in scattering with angular limitation projection electron lithography (SCALPEL)

(1) Mkrtchyan, Masis M a

a LUCENT TECHNOLOGIES (United States)

Author keywords

Aerial image; Charging; Contrast; Coulomb interactions; Electron beam; Electron beam projection lithography; Electron scattering; Mask membrane; Transmission

Indexed keywords

ELECTRON SCATTERING; MASKS; SILICON WAFERS;

SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON LITHOGRAPHY;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034430493 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.39.6881 Document Type: Article

Times cited : (9)

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