SCALPEL mask-membrane charging

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 223-226

  Mkrtchyan, M ^a   Gasparyan, A ^a   Mkhoyan, K ^a   Liddle, A ^a   Novembre, A ^a   Muller, D ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ELECTRIC CHARGE; ELECTRON SCATTERING; ELECTRON TRANSPORT PROPERTIES; ELECTROSTATICS; HOLE TRAPS; MASKS; MATHEMATICAL MODELS; MEMBRANES; SEMICONDUCTING FILMS; SILICON NITRIDE; THIN FILMS;

KINETIC EQUATIONS; MASK-MEMBRANE CHARGING; PLASMONS; SECONDARY ELECTRONS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0033131673     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00067-2     Document Type: Article

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