Determination of the possible magnitude of the charging effect in a SCALPEL mask membrane

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2888-2892

  Mkrtchyan, M M ^a   Gasparyan, A S ^a   Mkhoyan, K A ^a   Liddle, J A ^a   Novembre, A E ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033273885     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591090     Document Type: Article

References (12)

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3. D. A. Muller and J. A. Liddle, Electron Beam Radiation Damage in Silicon Nitride Membranes for SCALPEL Masks, Bell Labs Technical Memorandum, BL111A-980204-011M, BL11122D-9802040-081M (1998).
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