Performance investigation of Coulomb interaction-limited high throughput electron beam lithography based on empirical modeling

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3215-3220

  Han, Liqun ^a   McCord, Mark A ^a   Winograd, Gil I ^a   Pease, R F W ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000826133     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590354     Document Type: Article

References (14)

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