Global space charge effects in high throughput electron beam lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3777, Issue , 1999, Pages 192-214

  Han, Liqun ^a   Meisburger, W Dan ^a   Pease, R Fabian W ^a   Winograd, Gil I ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; CURRENT DENSITY; ELECTRIC SPACE CHARGE; IMAGE PROCESSING; INTEGRAL EQUATIONS; MONTE CARLO METHODS; PARTICLE BEAMS; PARTICLE OPTICS; PERFORMANCE; VARIATIONAL TECHNIQUES;

ABERRATION INTEGRAL; GLOBAL SPACE CHARGE EFFECTS; HIGH THROUGHPUT ELECTRON BEAM LITHOGRAPHY; PARAXIAL RAY EQUATION;

ELECTRON BEAM LITHOGRAPHY;

EID: 0033337497     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)