New inductively coupled plasma source design with improved azimuthal symmetry control

Plasma Sources Science and Technology

Volumn 9, Issue 4, 2000, Pages 545-561

  Khater, Marwan H ^a   Overzet, Lawrence J ^a  

^a The University of Texas at Dallas   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHLORINE; ETCHING; MAGNETIC FIELD EFFECTS; PLASMA DENSITY; SILICON WAFERS;

INDUCTIVELY COUPLED PLASMAS; STANDING WAVE EFFECTS;

PLASMA SOURCES;

EID: 0034324535     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/9/4/310     Document Type: Article

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