A traveling wave-driven, inductively coupled large area plasma source

Applied Physics Letters

Volumn 72, Issue 7, 1998, Pages 777-779

  Wu, Yaoxi ^a   Lieberman, M A ^b  

^a No 1760   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000865253     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120890     Document Type: Article

References (18)

1. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994).
2. V. Singh and J. Holland, IEEE Trans. Plasma Sci. 24, 133 (1996).
3. J. Hopwood, Plasma Sources Sci. Technol. 3, 460 (1994).
4. R. A. Stewart, P. Vitello, and D. B. Graves, J. Vac. Sci. Technol. B 12, 478 (1994).
5. L. J. Mahoney, A. E. Wendt, E. Barrios, C. J. Richards, and J. L. Shohet, J. Appl. Phys. 76, 2041 (1994).
6. H.-J. Lee, I.-D. Yang, and K.-W. Whang, Plasma Sources Sci. Technol. 5, 383 (1996).
7. I. M. El-Fayoumi and I. R. Jones, Plasma Sources Sci. Technol. 6, 201 (1997).
8. J. A. Stittsworth and A. E. Wendt, Plasma Sources Sci. Technol. 5, 429 (1996).
9. A. E. Wendt and L. J. Mahoney, Pure Appl. Chem. 68, 1055 (1996).
10. A. Hunscher and J. Mentel, Rev. Sci. Instrum. 67, 775 (1996).
11. M. A. Leiberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing, (Wiley, New York, 1994), Chap. 12, p. 375.
12. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994), Chap. 10, pp. 304-311.
13. Y. Wu and M. A. Lieberman, Experimental modeling of a traveling wave-excited inductively driven coil for a large area plasma source, Memorandum UCB/ERL M95/60, Electronics Research Laboratory, University of California, Berkeley, 1995 (unpublished).
14. M. A. Lieberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing, (Wiley, New York, 1994), Chap. 11, pp. 383-384.
15. L. Schott, Plasma Diagnostics, (North-Holland, Amsterdam, 1968), Chap. 11, pp. 669-695.
16. P. N. Wainman, M. A. Lieberman, and A. J. Lichtenberg, J. Vac. Sci. Technol. A 13, 2464 (1995).
17. J. K. Lee, I. Meng, Y. K. Shin, H. J. Lee, and T. H. Chung, Jpn. J. Appl. Phys., Part 1 36, 5714 (1997).
18. V. P. Gopinath and M. A. Lieberman, Simulation and analysis of a large area plasma source, Memorandum UCB/ERL M95/65, Electronics Research Laboratory, University of California, Berkeley, 1995 (unpublished).