Sheath resistance measurements in the GEC reference reactor

Plasma Sources Science and Technology

Volumn 8, Issue 4, 1999, Pages 534-543

  Kleber, Jennifer L ^a   Overzet, Lawrence J ^a  

^a UNIVERSITY OF TEXAS AT DALLAS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CHLORINE; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; ELECTRIC RESISTANCE; ELECTRODES; ELECTRONS; INTERFEROMETERS; IONS; MIXTURES; NITROGEN; PLASMA PROBES;

LANGMUIR PROBES; SHEATH RESISTANCE;

PLASMA SHEATHS;

EID: 0033311840     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/8/4/303     Document Type: Article

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