Effects of gas distribution on polysilicon etch rate uniformity for a low pressure, high density plasma

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 2, 1998, Pages 490-495

  Khater, Marwan H ^a   Overzet, Lawrence J ^a   Cherrington, Blake E ^a  

^a The University of Texas at Dallas   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040269784     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589852     Document Type: Article

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