Measurement of the induced plasma current in a planar coil, low-frequency, RF induction plasma source

Plasma Sources Science and Technology

Volumn 6, Issue 2, 1997, Pages 201-211

  El Fayoumi, I M ^a   Jones, I R ^a  

^a FLINDERS UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA INDUCTANCE; PLASMA RESISTANCE;

ARGON; ELECTRIC COILS; ELECTRIC CURRENT MEASUREMENT; ELECTRIC PROPERTIES; INDUCED CURRENTS;

PLASMA SOURCES;

EID: 0031140016     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/6/2/014     Document Type: Article

References (18)

1. Ogle J S 1990 US Patent 4 948 458
2. Coultas D K and Keller J H 1990 European Patent 0379828A2
3. Hopwood J, Guarnieri C R, Whitehair S J and Cuomo J J 1993 J. Vac. Sci. Technol. A 11 147
4. Meyer J A and Wendt A E 1995 J. Appl. Phys. 78 90
5. Meyer J A, Mau R and Wendt A E 1995 J. Appl. Phys. 79 1298
6. Hopwood J, Guarnieri C R, Whitehair S J and Cuomo J J 1993 J. Vac. Sci. Technol. A 11 152
7. Patrick R, Schoenborn P, Toda J and Bose F 1993 J. Vac. Sci. Technol A 11 1296
8. Carter J B, Holland J P, Peltzer E, Richardson B, Bogle E, Nguyen H T, Melaku Y, Gates D and Ben-Dor M 1993 J. Vac. Sci. Technol. A 11 1301
9. Keller J H, Forster J C and Barnes M S 1993 J. Vac. Sci. Technol. A 11 2487
10. Takayuki F, Tatuki N and Akihiro N 1993 Japan. J. Appl. Phys. 32 6076
11. Mahoney L J, Wendt A E, Barrios E, Richards C J and Shohet J 1994 J. Appl. Phys. 76 2041
12. Kortshagen U, Pukropski I and Zethoff M 1994 J. Appl. Phys. 76 2048
13. Hopwood J 1994 Plasma Sources Sci. Technol. 3 460
14. Godyak V A, Piejak R B and Alexandrovich B M 1994 Plasma Sources Sci. Technol. 3 169
15. Benzing J C, Broadbent E K and Rough K H 1994 US Patent 5 346 578
16. Huddlestone R H and Leonard S L 1965 Plasma Diagnostic Techniques (New York: Academic)
17. Domier C W, Peebles W A and Luhmann N C Jr 1988 Rev. Sci. Instrum. 59 1588
18. Piejak R B, Godyak V A and Alexandrovich B M 1992 Plasma Sources Sci. Technol. 1 179