Changes in structure and nature of defects by annealing of fluorinated amorphous carbon thin films with low dielectric constant

Applied Physics Letters

Volumn 72, Issue 21, 1998, Pages 2704-2706

  Yokomichi, Haruo ^a   Hayashi, Tohru ^a   Masuda, Atsushi ^b  

^a TOYAMA PREFECTURAL UNIVERSITY   (Japan)

^b JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001658222     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.121105     Document Type: Article

References (12)

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