Preparation of functionally gradient fluorocarbon polymer films by plasma polymerization of NF3 and propylene

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 34, Issue 2, 1996, Pages 193-198

  Tasaka, Akimasa ^a   Komura, Akiko ^a   Uchimoto, Yoshiharu ^b   Inaba, Minoru ^b   Ogumi, Zempachi ^b  

^a DOSHISHA UNIVERSITY   (Japan)

^b KYOTO UNIVERSITY   (Japan)

Author keywords

Fluorocarbon film; Functionally gradient material; Nitrogen trifluoride; Plasma polymerization; Propylene

Indexed keywords

FLUOROCARBON FILMS; FLUOROCARBON POLYMER FILM; FUNCTIONALLY GRADIENT; FUNCTIONALLY GRADIENT MATERIALS; GLASS SUBSTRATES; NITROGEN TRIFLUORIDE; PINHOLE-FREE SURFACES; SOURCE GAS; WATER DROP;

ADHESION; CONTACT ANGLE; FILM PREPARATION; FLUORINE; FLUORINE CONTAINING POLYMERS; PLASMA POLYMERIZATION; SUBSTRATES; FLUOROCARBONS; GLASS; MONOMERS; NITROGEN COMPOUNDS; PLASMA APPLICATIONS; PROPYLENE; SURFACE PROPERTIES; THIN FILMS;

PROPYLENE; POLYMERIZATION;

FLUOROCARBON FILM; FUNCTIONALLY GRADIENT MATERIAL; NITROGEN TRIFLUORIDE; PLASMA POLYMERIZATION;

EID: 0029734650     PISSN: 0887624X     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1099-0518(19960130)34:2<193::AID-POLA5>3.0.CO;2-V     Document Type: Article

References (21)

1. H. Biederman and Y. Osada, Plasma Polymerization Processes, Elsevier, New York, 1992, chapter 4.
2. K. Hozumi, K. Kitamura, and T. Kitade, Bull. Chem. Soc. Jpn., 54, 1392 (1981).
3. K. Yasuda, Y. Uchimoto, Z. Ogumi, and Z. Takehara, Ber. Bunsenges. Phys. Chem., 98, 631 (1994).
4. R. d'Agostino, F. Cramarossa, F. Fracassi, E. Desimoni, L. Sabbatini, P. G. Zambonin, and G. Caporiccio, Thin Solid Films, 43, 163 (1986).
5. R. d'Agostino, J. Vac. Sci. Technol., A3, 2627 (1985).
6. L. Martinu, H. Biederman, and J. Nedbal, Thin Solid Films, 136, 11 (1986).
7. S. F. Durrant, R. P. Mota, and M. A. Bica de Moraes, J. Appl. Phys., 71, 448 (1992).
8. K. Sato, S. Omae, K. Kojima, T. Hashimoto, and H. Koinuma, Jpn. J. Appl. Phys., 27, L2088 (1988).
9. O. Ruff, J. Fisher, and F. Luft, Z. Anorg. Allg. Chem., 172, 417 (1928).
10. Y. Yagi and A. E. Pavlath, J. Appl. Poly. Sci., 38, 215 (1984).
11. G. D. Merfeld and M. A. Petrich, J. Vac. Sci. Technol., A12, 364 (1994).
12. M. Strobel, S. Corn, C. S. Lyons, and G. A. Korba, J. Polym. Sci. Part A: Polym. Chem., 23, 1125 (1985).
13. H. Y. Li and M. A. Petrich, J. Vac. Sci. Technol., A10, 450 (1992).
14. J. Perrin, J. Mort, J. M. Siefert, and J. Schmitt, Plasma Chem. Plasma Process, 10, 571 (1990).
15. N. Kuniwake, Chemistry of Fluorine (in Japanese), Shokabo, Tokyo, 1988, pp. 55-62.
16. A. E. Pavlath and A. G. Pittman, in Plasma Polymerization, ACS Symposium Series, Vol. 108, M. Shen and A. T. Bell, Eds., American Chemical Society, Washington DC, 1979, p. 181.
17. H. Kobayashi, M. Shen, and A. T. Bell, J. Macromol. Sci. Chem., A8, 1345 (1974).
18. K. Nakajima, A. T. Bell, M. Shen, and M. Millard, J. Appl. Polym. Sci., 23, 2627 (1979).
19. A. W. Adamson, Physical Chemistry of Surfaces, 5th ed, Wiley, New York, 1990, p. 397.
20. H. Yasuda, A. K. Sharma, and T. Yasuda, J. Polym. Sci. Polym. Phys. Ed., 19, 1285 (1981).
21. Y. Taru and K. Takaoka, Kobunshi Ronbunshu, 43, 361 (1986).