Structural change in porous silica thin film after plasma treatment

Electrochemical and Solid-State Letters

Volumn 1, Issue 5, 1998, Pages 224-226

  Kondoh, E ^a,b,e   Baklanov, M R ^a,c,e   Bender, H ^a   Maex, K ^a,d  

^a IMEC   (Belgium)

^b KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

^c INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

^d UNIVERSITY OF LEUVEN   (Belgium)

^e ELECTROCHEMICAL SOCIETY   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA APPLICATIONS; POROUS SILICON; REFRACTIVE INDEX; THIN FILMS;

PLASMA TREATMENT;

DIELECTRIC FILMS;

EID: 0032205524     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1390693     Document Type: Article

References (7)

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6. F. N. Dultsev and M. R. Baklanov, Electrochem. Solid-State Lett., Submitted.
7. J. Proost, E. Kondoh, G. Vereecke, M. Heyns, and K. Maex, J. Vac. Sci. Technol. B, 16, 2091 (1998).