Microwave plasmatrons for giant integrated circuit processing

IEEE Transactions on Plasma Science

Volumn 28, Issue 1, 2000, Pages 288-297

  Petrin, Andrei B ^a  

^a JOINT INSTITUTE FOR HIGH TEMPERATURES   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTROMAGNETIC WAVE PROPAGATION; ELECTRON CYCLOTRON RESONANCE; INTEGRATED CIRCUIT MANUFACTURE; MAGNETOPLASMA; MICROWAVES; SEMICONDUCTOR DEVICE MANUFACTURE;

MICROWAVE ENERGY BALANCE; MICROWAVE PLASMA INTERACTION; MICROWAVE PLASMATRONS; NONUNIFORM MAGNETOACTIVE PLASMA; PLASMA MATERIALS PROCESSING APPLICATION;

PLASMA INTERACTIONS;

EID: 0033748832     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.842924     Document Type: Article

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