TE 01 excitation of an electron cyclotron resonance plasma source

IEEE Transactions on Plasma Science

Volumn 27, Issue 1, 1999, Pages 64-65

  Kinder, Ron L ^b   Kushner, Mark J ^a,b  

^a IEEE   (United States)

^b University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MATERIALS PROCESSING; POWER DEPOSITION;

CARRIER CONCENTRATION; COMPUTER SIMULATION; ELECTRIC FIELDS; ELECTROMAGNETIC WAVE PROPAGATION IN PLASMA; ELECTRON CYCLOTRON RESONANCE; FINITE DIFFERENCE METHOD; PLASMA DENSITY; TIME DOMAIN ANALYSIS;

PLASMA SOURCES;

EID: 0032678361     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/27.763038     Document Type: Article

References (4)

1. R. K. Porteous, H. M. Wu, and D. B. Graves, "A two-dimensional axisymmetric model of a magnetized glow discharge plasma," Plasma Sources Sci. Technol., vol. 3, no. 1, pp. 25-39, 1994.
2. M. Meyyapan and T. R. Govindan, "A multicomponent, multitemperature model for high density plasma processing reactors," J. Appl. Phys., vol. 80, no. 3, pp. 1345-1351, 1996.
3. W. Tan and T. A. Grotjohn, "Modeling the electromagnetic excitation of a microwave cavity plasma reactor," J. Vac. Sci. Technol. A, vol. 12, no. 4, pp. 1216-1220, 1994.
4. M. J. Grapperhaus, Z. Krivokapic, and M. J. Kushner, "Design issues in ionized metal physical vapor deposition of copper," J. Appl. Phys., vol. 83, no. 1, pp. 36-43, 1998.