Processing uniformity improvement by magnetic field distribution control in electron cyclotron resonance plasma chamber

Japanese Journal of Applied Physics

Volumn 32, Issue 1 S, 1993, Pages 322-326

  Nishimura, Hiroshi ^a   Kiuchi, Mikiho ^a   Matsuo, Seitaro ^a  

^a NTT CORPORATION   (Japan)

Author keywords

Convex lens effect; ECR plasma; Magnetic field distribution; Uniformity improvement

Indexed keywords

ELECTROMAGNETIC WAVE PROPAGATION; INTEGRATED CIRCUIT MANUFACTURE; IONIZATION; MAGNETIC FIELD EFFECTS; MICROWAVES; REFRACTIVE INDEX; SEMICONDUCTOR PLASMAS; SILICA;

ELECTRON CYCLOTRON RESONANCE (ECR); ION INCIDENCE; MAGNETIC FIELD DISTRIBUTION; PLASMA CHAMBER; PLASMA GENERATION REGION; PLASMA REFRACTIVE INDEX; PROCESSING UNIFORMITY IMPROVEMENT;

CYCLOTRON RESONANCE;

EID: 0027201437     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.32.322     Document Type: Article

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