8“ uniform electron cyclotron resonance plasma source using a circular TE01 mode microwave

Japanese Journal of Applied Physics

Volumn 32, Issue 1 R, 1993, Pages 174-178

  Hidaka, Ryota ^a   Yamaguchi, Toru ^a   Hirotsu, Nobuyoshi ^a   Ohshima, Takaharu ^a   Koga, Ryuji ^a   Tanaka, Masayoshi ^b   Kawai, Yoshinobu ^b  

^a NIPPON STEEL CORPORATION   (Japan)

^b KYUSHU UNIVERSITY   (Japan)

Author keywords

ECR plasma source; Etching; Ion energy; Ion saturation current density; TE01 mode microwave

Indexed keywords

CYCLOTRON RESONANCE; ELECTRIC CURRENTS; ETCHING; INTEGRATED CIRCUIT MANUFACTURE; IONS; MAGNETIC FIELD EFFECTS; MICROWAVES; ULSI CIRCUITS;

CIRCULAR TE MODE MICROWAVE; ELECTRON CYCLOTRON RESONANCE; ION ENERGY; ION SATURATION CURRENT DENSITY;

PLASMA SOURCES;

EID: 0027224873     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.32.174     Document Type: Article

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