Behavior of Ar plasmas formed in a mirror field electron cyclotron resonance microwave ion source

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 8, Issue 3, 1990, Pages 2893-2899

  Gorbatkin, S M ^a   Berry, L A ^a   Roberto, J B ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000937792     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.576645     Document Type: Article

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