Modeling and simulation of high density plasmas

Japanese Journal of Applied Physics

Volumn 32, Issue 6 S, 1993, Pages 2999-3006

  Graves, David B ^a   Wu, Hanming ^a   Porteous, Robert K ^a,b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

Electron cyclotron resonance; High density plasma sources; Plasma simulation

Indexed keywords

CYCLOTRON RESONANCE; ELECTRON RESONANCE; MATHEMATICAL MODELS; MICROWAVES; PLASMA SOURCES; SIMULATION;

ECR PLASMA; HIGH DENSITY PLASMA; MICROWAVE POWER;

PLASMAS;

EID: 0027617780     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.32.2999     Document Type: Article

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