Remote-coupled sensing of plasma harmonics and process end-point detection

Vacuum

Volumn 57, Issue 4, 2000, Pages 351-364

  Law, V J ^a   Kenyon, A J ^a   Thornhill, N F ^a   Srigengan, V ^b   Batty, I ^c  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

^b OXFORD INSTRUMENTS PLASMA TECHNOLOGY   (United Kingdom)

^c CB4 8RB   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTORESISTS; REMOTE SENSING; SILICA; WATER;

PLASMA HARMONICS; PROCESS END-POINT DETECTION;

PLASMA APPLICATIONS;

EID: 0033690036     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(00)00229-3     Document Type: Article

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