Internal and external electrical diagnostics of RF plasmas

Plasma Sources Science and Technology

Volumn 6, Issue 2, 1997, Pages 133-139

  Braithwaite, N St J ^a  

^a OPEN UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISCHARGES; ELECTRIC IMPEDANCE MEASUREMENT; SURFACE PHENOMENA;

ELECTRICAL PLASMA DIAGNOSTICS;

PLASMA DIAGNOSTICS;

EID: 0031139768     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/6/2/006     Document Type: Article

References (22)

1. Olthoff J K and Greenberg K E 1995 J. Res. Natl Inst. Stand. Technol. 100 327
2. Sobolewski M A 1992 J. Vac. Sci. Technol. A 10 3550
3. Mahony C M A O and Graham W G 1996 private communication
4. Sobolewski M A 1995 J. Res. Natl Inst. Stand. Technol. 100 341
5. Lieberman M A and Lichtenberg A J 1995 Principles of Plasma Discharges and Materials Processing (New York: Wiley)
6. Coburn J W and Kay E 1972 J. Appl. Phys. 43 4965
7. Olthoff J K, van Brunt R J and Radovanov S B 1995 J. Res. Natl Inst. Stand. Technol. 100 383
8. Snijkers R J, van Sambeek M J M, Kroesen G M W and de Hoog F J 1993 Appl. Phys. Lett. 63 308
9. Goruppa A A and Braithwaite N St J 1994 Diamond Rel. Mater. 3 1223
10. Konuma M and Bauser E 1993 J. Appl. Phys. 74 62
11. Janes J and Huth C 1992 Appl. Phys. Lett. 61 261
12. Booth J P and Hancock G 1993 Mater. Sci. Forum 140 219
13. Nakano T, Sadeghi N, Trevor D, Gottscho R A and Boswell R W 1992 J. Appl. Phys. 72 3384
14. Sadeghi N, Nakano T, Trevor D and Gottscho R A 1991 J. Appl. Phys. 70 2552
15. Haverlag M, Kono A, Passchier D, Kroesen G M W, Goedheer W J and de Hoog F J 1991 J. Appl. Phys. 70 3472
16. Den Hartog E A, Persing H and Claude Woods R 1990 Appl. Phys. Lett. 57 661
17. Manenschijn A, Janssen G C A M, van der Drift E and Radelaar S 1991 J. Appl. Phys. 69 1253
18. Manenschijn A, van der Drift E, Janssen G C A M and Radelaar S 1991 J. Appl. Phys. 69 7996
19. Usmanov R D and Baidarovtsev Yu P 1991 High Energy Chem. 24 467
20. Braithwaite N St J, Booth J P and Cunge G 1996 Plasma Sources Sci. Technol. 5 677
21. Hopkins M B and Graham W G J. Appl. Phys. 69 3461
22. Law V, Braithwaite N St J, Ingram S G, Clary D C C and Jones G A C 1994 J. Vac. Sci. Technol. B 12 3337