A noninvasive rf probe for the study of ionization and dissociation processes in technological plasmas

Journal of Applied Physics

Volumn 86, Issue 8, 1999, Pages 4100-4106

  Law, V J ^a   Kenyon, A J ^a   Clary, D C ^a   Batty, I ^b  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

^b Cambridge Analogue Technology Ltd   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003229472     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371334     Document Type: Article

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