Virtual plasma equipment model: A tool for investigating feedback control in plasma processing equipment

IEEE Transactions on Semiconductor Manufacturing

Volumn 11, Issue 3, 1998, Pages 486-494

  Rauf, Shahid ^a,b   Kushner, Mark J ^a,b  

^a IEEE   (United States)

^b University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; COMPUTER AIDED MANUFACTURING; COMPUTER SIMULATION; FEEDBACK CONTROL; MICROELECTRONIC PROCESSING; PLASMA APPLICATIONS;

SOFTWARE PACKAGE VIRTUAL PLASMA EQUIPMENT MODEL (VPEM);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032136286     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.705383     Document Type: Article

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